Patent · US Expired

Method and system for monitoring resources within a manufacturing environment

US6816746B2 · kind B2 · utility

29Cited by
121References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 5, 2001
Grant dateNov 9, 2004
Priority date
Expiry dateJan 4, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06Q10/063114
  • WIPO fieldIT methods for management
  • WIPO sectorElectrical engineering

Abstract

A method, system and logic are described for monitoring resources within a manufacturing environment. A system for monitoring resources within a manufacturing facility includes a remote monitoring system coupled to one or more pieces of equipment within the manufacturing facility. The remote monitoring system may be communicatively coupled to a control center operable to display status information associated with using the one or more pieces of equipment, and a simulator communicatively coupled to the remote monitoring system is operable to dynamically simulate resource re-allocation based on the inoperability of the one or more pieces of equipment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.