Cut and puncture resistant laminated fabric
US6818091B1 · kind B1 · utility
21Cited by
21References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 1997 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | Oct 24, 2017 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB32B2323/043
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to a process for making a puncture resistant laminated fabric comprising laminating a layer of polyethylene film to a layer of fabric comprised of an ultra high molecular weight polyethylene. The laminating step is conducted at a temperature between about 230° F. and about 290° F. with a contact time of between about 5 minutes and about 15 minutes with the application of a laminating pressure of between about 50 psi and about 500 psi.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.