Silicon oxide film
US6818310B2 · kind B2 · utility
54Cited by
7References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2003 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | Jan 6, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31667
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A silicon oxide film is formed on the surfaces of a plastic substrate and contains methyl groups and methylene groups in a portion near the interface to the plastic substrate. The silicon oxide film exhibits not only excellent adhesion to the plastic substrate, softness and flexibility but also exhibits excellent gas shut-off property (gas barrier property), makes it possible to achieve excellent gas-shutoff property with a smaller film thickness than that of the conventional films, and can be mass-produced favorably.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.