Feed forward leveling
US6818365B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 15, 2002 |
| Grant date | Nov 16, 2004 |
| Priority date | — |
| Expiry date | Jun 12, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for leveling an exposure field of view at a peripheral edge of a substrate. The field of view is aligned to a first position at the peripheral edge of the substrate, where the field of view has an inner edge and an outer edge, relative to the peripheral edge of the substrate. Whole device patterns within the field of view are identified, and the alignment of the field of view is altered to a second position so as to place the outer edge of the field of view adjacent the whole device patterns within the field of view. Level measurement information from the field of view at the second position is acquired and stored. The field of view is realigned to the first position, and the substrate is leveled within the field of view at the first position using the level measurement information acquired from the field of view at the second position.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.