Mass flow sensor having an improved membrane stability
US6820481B1 · kind B1 · utility
8Cited by
13References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 30, 2000 |
| Grant date | Nov 23, 2004 |
| Priority date | — |
| Expiry date | Oct 30, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/6845
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A mass flow sensor is described. To improve the membrane stability of the known mass flow sensor, in particular the reoxide layer which is present in the known mass flow sensor is replaced by a thicker PECVD silicon oxide layer. The thickness of the silicon oxide layer deposited on the platinum layer is increased, and the known mass flow sensor is also provided with a cover layer of PECVD silicon nitride forming a moisture barrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.