Verification photomask
US6824931B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 13, 2002 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Nov 29, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70591
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A verification photomask disclosed. The mask may be for process window verification purposes when switching between fabrication equipment, and/or for optical proximity correction (OPC) verification purposes. The mask includes device areas that are separated by scribe lines. One or more verification patterns are integrated into the scribe lines for verification purposes. These patterns can include: proximity patterns, photoresist-spacing patterns, polysilicon end cap patterns, as well as other patterns. A method for making the mask, and a semiconductor device created at least in part by a method including use of the mask, are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.