Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same
US6824954B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2002 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Jan 8, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A sulfonyloxime compound is provided which is represented by a general formula (1): wherein, R1 represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R2 represents an alkyl group, an aryl group, or a heteroaryl group; X represents a halogen atom; Y represents —R3, a —CO—R3 group, —COO—R3 group, —CONR3R4 group, —S—R3 group, —SO—R3 group, —SO2—R3 group, a —CN group or a —NO2 group, and R3 and R4 within the Y group each represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, although any two of R1, R2 and R3 may also be bonded together to form a cyclic structure, and furthermore dimers of a compound represented by the general formula (1) in which R1, R2 or Y groups from separate molecules are bonded together to form a single bivalent group, are also possible. This compound is very useful as a radiation sensitive acid generator which is sensitive to activated radiation such as far ultraviolet radiation or electron beams and the like, and displays superior heat stability and storage stability. Furthermore, chemically amplified positive type or negative…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.