Micro-fluidic devices
US6825127B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 24, 2001 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | May 3, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/0353
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In a method of fabricating a microstructure for micro-fluidics applications, a mechanically stable support layer is formed over a layer of etchable material. An anisotropic etch is preformed through a mask to form a pattern of holes extending through the support layer into said etchable material. An isotropic etch is performed through each said hole to form a corresponding cavity in the etchable material under each hole and extending under the support layer. A further layer of depositable material is formed over the support layer until portions of the depositable layer overhanging each said hole meet and thereby close the cavity formed under each hole. The invention permits the formation of micro-channels and filters of varying configuration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.