Method and apparatus for controlling system parameters
US6826504B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2001 |
| Grant date | Nov 30, 2004 |
| Priority date | — |
| Expiry date | Nov 19, 2021 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF02D41/008
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and an apparatus for controlling system parameters, in particular for controlling the voltage applied to piezoelectric elements (10, 20, 30, 40, 50, 60) within a circuit (A) for charging and discharging piezoelectric elements (10, 20, 30, 40, 50, 60) are described. The method is characterized by modifying at least one control parameter for the control of a system parameter, in particular a target voltage for the voltage applied to a piezoelectric element (10, 20, 30, 40, 50, 60), in view of at least one systematic error occurring during a first control procedure of the system parameter to obtain a corrected control parameter for a second and/or a further control of the system parameter. The apparatus is particularly eligible for use with the inventive method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.