Cerium oxide slurry, and method of manufacturing substrate
US6827752B2 · kind B2 · utility
4Cited by
2References
9Claims
0Family size
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Key dates
| Filing date | Mar 12, 2003 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Mar 12, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K3/1463
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A problem to be solved is to provide a slurry that is capable of flattening an uneven film on a substrate with good precision, and that has good stability, not separating into two layers, solidifying through flocculated settling or undergoing changes in viscosity. This problem is solved by adding poly ammonium acrylates having different degrees of neutralization to one another as surfactants to a cerium oxide slurry containing cerium oxide particles, and suitably adjusting the total amount of polyacrylates added.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.