Electrophotosensitive material and method of producing the same
US6828076B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 27, 2003 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Oct 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03G5/142
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An electrophotosensitive material comprising a supporting substrate, an intermediate layer containing a thermosetting resin formed on the supporting substrate, and a photosensitive layer formed on the intermediate layer, wherein a contact angle of the surface of the intermediate layer is not less than a value (A°) represented by the formula: A°=B°−2° in which B° is a contact angle corresponding to an intersection of a first approximation linear line and a second approximate linear line minus 2° in a correlation curve between a residual potential of the photosensitive material comprising the predetermined photosensitive layer formed on the intermediate layer containing the thermosetting resin and a contact angle of the intermediate layer containing the thermosetting resin. According to this photosensitive material, it is possible to obtain a good image, which has a low residual potential and is free from fog.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.