Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern
US6828078B2 · kind B2 · utility
5Cited by
12References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2002 |
| Grant date | Dec 7, 2004 |
| Priority date | — |
| Expiry date | Mar 12, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.