Method and apparatus for coating a substrate in a vacuum
US6830626B1 · kind B1 · utility
28Cited by
32References
36Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 22, 2002 |
| Grant date | Dec 14, 2004 |
| Priority date | — |
| Expiry date | Jul 24, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for coating a substrate with a deposition material in a vacuum wherein a material source having a substantially longitudinal deposition emission component is used to create a substantially longitudinal material deposition emission plume which coats the surface of the substrate without increasing the throw distance between the substrate and the material source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.