Detergent composition
US6831048B2 · kind B2 · utility
20Cited by
6References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2002 |
| Grant date | Dec 14, 2004 |
| Priority date | — |
| Expiry date | Oct 23, 2022 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning composition comprising (1) at least one of fluoride salts and hydrogendifluoride salts; (2) an organic solvent having a hetero atom or atoms; and (3) water; a method of cleaning metal gate, contact hole, via hole and capacitor using the composition; a method of cleaning a residual polymer derived from a resist using the composition; and a method of cleaning after CMP using the composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.