Patent · US Expired

Method of manufacturing nonlinear element, method of manufacturing electrooptic device, electrooptic device, and electronic apparatus

US6831728B2 · kind B2 · utility

1Cited by
3References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 4, 2002
Grant dateDec 14, 2004
Priority date
Expiry dateMay 18, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N70/00
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present invention provides a method of manufacturing a nonlinear element capable further improving nonlinearity of a nonlinear element, an electrooptic device, and electronic apparatus. In forming an element substrate of a liquid crystal device, an underlying layer is formed on the surface of the element substrate in the underlying layer forming step (a), and then a first metal film having a metal film containing at least Ta is formed in the first metal film forming step (b). Then, in the insulating film forming step (c), the first metal film is annealed under high pressure in an atmosphere containing water vapor to form an insulating film on the first metal film. Then, in the second metal film forming step, a second metal film is formed on the surface of the insulating film to produce a nonlinear element.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.