Abatement of effluent from chemical vapor deposition processes using ligand exchange resistant metal-organic precursor solutions

US6833024B2 · kind B2 · utility

Assignee

• Adanced Technology Materials, Inc. · US

Inventors

• Mark Holst · Concord, US
• Rebecca Faller · Hayward, US
• Glenn M. Tom · New Milford, US
• Jose I. Arno · Brookfield, US
• Ray Dubois · Mesa, US

Key dates

• Filing date: Oct 23, 2002
• Grant date: Dec 21, 2004
• Expiry date: Jan 7, 2023

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B01D2258/0216
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

Apparatus and method for abatement of effluent from multi-component metal oxides deposited by CVD processes using metal source reagent liquid solutions which comprise at least one metal coordination complex including a metal to which is coordinatively bound at least one ligand in a stable complex and a suitable solvent medium for that metal coordination complex e.g., a metalorganic chemical vapor deposition (MOCVD) process for forming barium strontium titanate (BST) thin films on substrates. The effluent is sorptively treated to remove precursor species and MOCVD process by-products from the effluent. An endpoint detector such as a quartz microbalance detector may be employed to detect incipient breakthrough conditions in the sorptive treatment unit.