Article having photocatalytic activity
US6833089B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2000 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Sep 13, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2495
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.