Supplying and exhausting system in plasma polymerizing apparatus
US6833120B2 · kind B2 · utility
1Cited by
1References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2002 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Jan 2, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2252/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plasma polymerizing apparatus is provided which comprises at least one chamber in which sheet to be coated can be moved continuously, at least one gas inlet supplying reactive gas into the chamber, and at least one gas outlet exhausting the reactive gas out of the chamber, wherein the gas inlet and the gas outlet are disposed on the chamber in such a way that reactive gas flows in substantially parallel with moving direction of the sheet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.