Film coated optical lithography elements and method of making
US6833949B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 9, 2002 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Feb 19, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2203/46
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.