Window for allowing end point of etching process to be detected and etching device comprising the same
US6835276B2 · kind B2 · utility
0Cited by
9References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2002 |
| Grant date | Dec 28, 2004 |
| Priority date | — |
| Expiry date | Jan 28, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32963
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An end point detection window prevents process failures in a plasma etching device. The end point detection window has a body of aluminum or an aluminum alloy through which a hole extends to provide a path along which light generated during the etching process can pass from the process chamber, and a capping section coupled to a light outlet of the body. The capping section is of quartz for allowing the light passing through the hole in the body to be transmitted out of the process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.