Patent · US Expired

Method and apparatus for pulse-position synchronization in miniature structures manufacturing processes

US6835426B2 · kind B2 · utility

7Cited by
12References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 20, 2003
Grant dateDec 28, 2004
Priority date
Expiry dateMar 20, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70041
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Pulse-position synchronized deposition of a material in miniature structure manufacturing processes is carried out in a fabrication tool including a material carrier element, a source of energy generating pulses of energy, a substrate, and a control unit operatively coupled to the source of energy, substrate, and the material carrier element. The control unit exposes a first area of the material carrier element to a first pulse of energy, pauses the exposure while initiating relative motion between the source of energy and the substrate at a predetermined first speed and relative motion between the material carrier element and the energy source at a predetermined second speed which is a function of the first speed, and slowing (or stopping) relative motion between the energy source, material carrier element, and the substrate, while exposing the unablated area of the material carrier element adjacent to previously ablated area to a second pulse of energy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.