Method for providing and utilizing rerouting resources
US6835605B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 9, 2002 |
| Grant date | Dec 28, 2004 |
| Priority date | — |
| Expiry date | Mar 1, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for selectively providing and utilizing electrical pathway routing resources in a semiconductor device including providing a multi-level semiconductor device which has at least two metallization layers including metal lines for carrying electrical signals, wherein the metal lines include first metal lines provided for electrical communication with a third metal line, and the first metal lines and third metal line provided in a common metallization layer and second metal lines provided for electrical communication with the third metal line through respective vias, the second metal lines and third metal line provided in respective separate metallization layers; and, selectively providing at least one rerouting metal line to provide an alternative electrical pathway from at least one second metal line to the third metal line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.