Material handling system and method for a multi-workpiece plasma treatment system
US6841033B2 · kind B2 · utility
11Cited by
62References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2001 |
| Grant date | Jan 11, 2005 |
| Priority date | — |
| Expiry date | Jan 9, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma treatment system in which untreated workpieces are serially received one at a time on an infeed table but stored in parallel on the infeed table. The untreated workpieces are transferred simultaneously, in parallel, into a plasma treatment chamber. Thereafter, treated workpieces are transferred simultaneously, in parallel, out of the plasma treatment chamber onto an outfeed table; and the outfeed table serially discharges the treated workpieces one at a time from the outfeed table.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.