Gas flow rate measuring device and gas flow rate measuring method
US6842705B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 8, 2003 |
| Grant date | Jan 11, 2005 |
| Priority date | — |
| Expiry date | Aug 8, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0026
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A gas flow measuring device and gas flow measuring method are disclosed wherein specific gas component of measuring object gas or target gas composed of gas different from the specific gas component are added to or extracted from the measuring object gas, and concentrations C1 and C2 of the specific gas component before and after the target gas is added to or extracted. A detector (111, 121) is provided to calculate the flow rate Q1 in response to the detected concentrations C1, C2 or to detect the flow rate Q1 of the measuring object gas, and the flow rate Q3 of added or extracted target gas is detected in response to the flow rate Q1 and the concentrations C1, C2 which are detected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.