Patent · US Expired

Method of producing a strain-sensitive resistor

US6842970B2 · kind B2 · utility

3Cited by

9References

2Claims

0Family size

Assignee

Mannesmann VDO AG · DE

Inventors

Arthur Schäfert · Schwalbach, DE
Jürgen Irion · Pocking, DE
Zlatko Penzar · Dietzenbach, DE
Wolfgang Porth · Frankfurt am Main, DE

Key dates

Filing date	Nov 6, 2002
Grant date	Jan 18, 2005
Priority date	—
Expiry date	Nov 6, 2022

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/4913
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A method of producing a strain sensitive resistor includes matching an area of a film insulating layer to a shape of a recess in a surface of a support element. The film insulating area is applied to the support element so that the area of the film matching the shape of the recess is congruent with the shape of the recess. A resistive layer comprising strain-sensitive resistors is applied to the film insulating layer and the film insulating layer and the resistive layer are applied to heat treatment.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.