System for producing patterned deposition from compressed fluid in a dual controlled deposition chamber
US6843556B2 · kind B2 · utility
1Cited by
11References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2002 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Dec 28, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system (10) produces patterned deposition on a substrate (14) from compressed fluids. A delivery system (12) cooperates with an independently controlled first chamber and an independently controlled second chamber retaining a substrate (14) for receiving precipitated functional material along a fluid flow delivery (13) from the delivery system (12). A shadow mask (22) is arranged in close proximity to the substrate (14) for forming the patterned deposition on the substrate (14).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.