Method for purifying trichlorosilane

US6843972B2 · kind B2 · utility

Assignee

• SOLARWORLD AG · DE

Inventors

• Stephan Klein · Mettmann, DE
• Hans-Dieter Block · Cologne, DE
• Hans-Joachim Leimkühler · Leverkusen, DE
• Werner Dick · Leverkusen, DE
• Johannes-Peter Schafer · Lingen (Ems), DE

Key dates

• Filing date: Nov 6, 2001
• Grant date: Jan 18, 2005
• Expiry date: Nov 6, 2021

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01B33/10778
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The invention relates to a method for removing anhydrous acids and hydrohalogens from trichlorosilane by contacting the trichlorosilane with solid bases. The invention further relates to the use of the trichlorosilane so purified in the production of silane and/or super-pure silicon.