Patent · US Expired

Method of manufacturing color filter

US6844121B2 · kind B2 · utility

1Cited by

3References

11Claims

0Family size

Assignee

Premier Image Technology Corporation · TW

Inventors

Eric Wang · Tempe, US
Robin Shyu · Taichung, TW
Jim Chung · Fanlu, TW
Michael Kuo · Las Vegas, US

Key dates

Filing date	Dec 27, 2002
Grant date	Jan 18, 2005
Priority date	—
Expiry date	Jan 29, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0007
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of manufacturing color filter comprising the steps of forming a metal layer and a photoresistor layer on a substrate; defining a dent over the photoresistor layer and removing the metal layer below the dent; depositing an optical filter material over the resulting structure at relative high temperature, lift off the photoresistor layer by etching the metal layer. The optical filter material can be fabricated at higher temperature (300-400° C.) than conventional cold process, the extinction ratio of the filter made by the optical filter material can be as high as 90% to enhance the performance of the projector system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.