Process of forming a microneedle and microneedle formed thereby
US6844213B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 22, 2002 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Mar 2, 2023 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61M2037/0053
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A microneedle and a process of forming the microneedle of single-crystal silicon-based material without the need for deposited films. The microneedle comprises a piercing end, an oppositely-disposed second end, and an internal passage having an opening adjacent the piercing end. The cross-section of the microneedle, and therefore the passage within the microneedle, is defined by first and second walls formed of doped single-crystal silicon-based material and separated by the passage, and first and second sidewalls separated by the passage, sandwiched between the first and second walls, and formed of single-crystal silicon-based material that is more lightly doped than the first and second walls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.