Patent · US Expired

Electro-optical device, electronic apparatus, and method for manufacturing electro-optical device

US6844955B2 · kind B2 · utility

3Cited by
6References
19Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 3, 2002
Grant dateJan 18, 2005
Priority date
Expiry dateSep 11, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F1/133553
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention provides an electro-optical device, an electronic apparatus using the electro-optical device, and a method for manufacturing an electro-optical device. High-quality image display may be realized by avoiding abnormal exposures during formation of a photosensitive resin layer on a transparent substrate by using photolithography. A TFT-arrayed substrate of a reflective or transflective electro-optical device is manufactured in such a manner that a photosensitive resin is exposed from the front face side of the TFT-arrayed substrate after the photosensitive resin is applied, while the TFT-arrayed substrate is held at the rear face side thereof by a vacuum chuck. In this case, since a light-shielding film is formed at the lower side of a photosensitive resin layer, a risk in that light transmitted through the TFT-arrayed substrate is reflected by the vacuum chuck and thereby transfers marks and the like of suction holes to the photosensitive resin can be reduced or avoided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.