Micromirror having counterbalancing structures and method for manufacturing same
US6846087B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 30, 2002 |
| Grant date | Jan 25, 2005 |
| Priority date | — |
| Expiry date | Nov 12, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0816
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multilayer micromirror structure that exhibits substantially no form change as a result of a given change in temperature is disclosed. A reflective layer is disposed on a substrate layer, and a counterbalancing structure is disposed on the structure in a way such that a neutral plane is located at a predetermined position relative to the substrate layer and the reflective layer. When forces are exerted at the neutral plane of such a structure, the structure attains a predetermined geometric form. A method of manufacture is disclosed wherein a substrate is etched to define a desired structure and a conformal layer of a masking material is deposited onto the etched substrate. Further etching exposes portions of the substrate and silicon is deposited to achieve another desired structure. Excess material is etched away to free the finished structure and a reflective layer is deposited onto the surface of the structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.