Patent · US Expired

Methods for producing indium-containing aqueous solutions containing reduced amounts of metal impurities

US6846470B2 · kind B2 · utility

1Cited by
7References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 5, 2002
Grant dateJan 25, 2005
Priority date
Expiry dateJul 21, 2022

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S423/14
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A method for producing an indium-containing aqueous solution having a reduced amount of metal impurities is provided. A method for producing an indium-containing aqueous solution having a reduced amount of metal impurities which comprises bringing an aqueous solution containing indium and metal impurities whose hydrogen ion concentration is adjusted at 0.5 mol/L to 3 mol/L into contact with a non-chelate ion-exchange resin to remove the metal impurities, and a method for producing an indium-containing aqueous solution having a reduced amount of metal impurities which comprises bringing an aqueous solution containing indium and metal impurities into contact with a chelate ion-exchange resin to remove the metal impurities are provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.