Forgery/alteration protective material
US6846547B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2001 |
| Grant date | Jan 25, 2005 |
| Priority date | — |
| Expiry date | Jun 29, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2998
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
The purpose of the invention is to provide a forgery/alteration protective material which containing a retroreflecting material and having an improved forgery/alteration protecting effect against the process of the upper part of the material.In order to achieve the above purpose, the forgery/alteration protective material 2 according to the invention where a retroreflecting material 4 for returning the incident light substantially along the path along which the incident light travels is provided and a transparent film 6 is layered on the retroreflecting material 4 is characterized in that a low transmittance layer 8 formed of a material having a lowerer light transmittance than that of the transparent film 6 is provided between the retroreflecting material 4 and the transparent film layer 6, and the light transmittance of the low transmittance layer 8 is 45% or higher to the light in the wavelength range of 420 nm to 700 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.