Patent · US Expired

Method for making micromechanical structures having at least one lateral, small gap therebetween and micromechanical device produced thereby

US6846691B2 · kind B2 · utility

7Cited by
21References
7Claims
0Family size

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Inventors

Key dates

Filing dateJul 24, 2003
Grant dateJan 25, 2005
Priority date
Expiry dateJul 24, 2023

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH03H2009/02496
  • WIPO fieldBasic communication processes
  • WIPO sectorElectrical engineering

Abstract

A method and resulting formed device are disclosed wherein the method combines polysilicon surface-micromachining with metal electroplating technology to achieve a capacitively-driven, lateral micromechanical resonator with submicron electrode-to-resonator capacitor gaps. Briefly, surface-micromachining is used to achieve the structural material for a resonator, while conformal metal-plating is used to implement capacitive transducer electrodes. This technology makes possible a variety of new resonator configurations, including disk resonators and lateral clamped-clamped and free-free flexural resonators, all with significant frequency and Q advantages over vertical resonators. In addition, this technology introduces metal electrodes, which greatly reduces the series resistance in electrode interconnects, thus, minimizing Q-loading effects while increasing the power handling ability of micromechanical resonators.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.