High contrast surface marking using irradiation of electrostatically applied marking materials
US6852948B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 13, 2001 |
| Grant date | Feb 8, 2005 |
| Priority date | — |
| Expiry date | Jun 13, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M5/267
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method of radiantly marking substrates including metals, plastics, ceramic materials, glazes, glass ceramics, and glasses of any desired form, which comprises electrostatically applying to the material to be marked a variable thickness layer of marking material containing energy absorbing components and/or enhancers, then irradiating said layer with a radiant energy source such as a laser or diode based energy source such that the radiation is directed onto said layer, optionally in accordance with the form of the marking to be applied, preferably using a laser or diode based energy source of a wavelength which is sufficiently absorbed by the marking material so as to create a bonding of the marking material to the surface of the workpiece at the irradiated areas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.