Transflective type LCD and method for manufacturing the same
US6853421B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 26, 2002 |
| Grant date | Feb 8, 2005 |
| Priority date | — |
| Expiry date | Jul 26, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136236
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a transflective type LCD provided with a transparent region and a reflection region in each pixel, when an irregular film 11 is formed on an active matrix substrate 12 to form irregularities of a reflection electrode film 6, the irregular film 11 is specifically formed to almost the same film thickness in both the transparent region and the reflection region to provide substantially the same inter-substrate gap in these two regions so that they may have almost the same V-T characteristics and also the reflection electrode film 6 made of Al/Mo is formed so as to overlap with a transmission electrode film 5 made of ITO all around an outer periphery of the transmission electrode film 5 by a width of at least 2 μm, thus suppressing electric erosion from occurring between the ITO and Al substances at the edge of the transmission electrode film 5.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.