Projection aligner
US6853441B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 2002 |
| Grant date | Feb 8, 2005 |
| Priority date | — |
| Expiry date | Dec 26, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7003
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The projection aligner transfers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side of the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image of the mask pattern. The size of the image formed on the substrate is adjusted by moving the reflector along the optical axis of the lens unit, and the deflector along the optical path of the light beam passed through the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.