Measurement of components that have been micro-galvanically produced, using a sample component by means of photoresist webs
US6854347B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 9, 2002 |
| Grant date | Feb 15, 2005 |
| Priority date | — |
| Expiry date | Dec 10, 2022 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF02M2200/9046
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A method for measuring microgalvanically produced components having a three-dimensional, depth-lithographically produced structure, which provides a single- or multilayer component which is constructed using galvanic metal deposition, the metal being deposited around a structure of photoresist defining the desired orifice contour of the component; in the process, a photoresist region, which selectively interrupts the structure of the component to be manufactured, being incorporated during the microgalvanic production; at least the interrupting photoresist region being dissolved out of the interrupted component; and a contactless measuring of the orifice structure of the interrupted component being undertaken in the region of a previously existing resist edge of the photoresist region using a measuring device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.