Face mask support
US6854465B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2003 |
| Grant date | Feb 15, 2005 |
| Priority date | — |
| Expiry date | Aug 19, 2023 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61M16/0633
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A face mask support for CPAP comprising a hemispheric cap with biasing means support at the medial line of the head. The circumferential edge of the cap extends from the high forehead to below the inion protrusion at the nape of the neck. A biasing means which is preferably of a length of spring steel is formed so as to extend from the biasing means support to form a loop around a face mask. The biasing means may be adjusted to accommodate facial configurations and to vary the pressure with which the face mask is apposed to the face. In an alternative embodiment, the support is open and is comprised of a circumferential band extending from the middle of the forehead to below the inion protrusion and a medial band extending along the medial line of the head and connecting to the circumferential band at the middle of the forehead and below the inion protrusion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.