Apparatus for placing particles in a pattern onto a substrate
US6855205B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2003 |
| Grant date | Feb 15, 2005 |
| Priority date | — |
| Expiry date | Jan 30, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for placing particles onto a substrate, methods for using the apparatus to deposit particles on a substrate and substrates prepared using the apparatus are disclosed. The apparatus includes a rotary screen, a blade disposed for directing and urging the particles through the screen, and a sheet mounted in a position to receive the particles from a feeder and deliver the particles to the rotary screen substantially across the blade. The apparatus can include a frame on which a rotary screen is rotatably mounted and a feed system disposed within and extending substantially along the length of the screen for distributing the particles. The apparatus can optionally include a vacuum means, an anti-static means and/or collection pans for handling stray particles. The screen can include a series of openings in the form of a pattern, and can be used to place particles in a pattern in register with a design or pattern on a substrate as the substrate passes under the openings in the screen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.