Induction plasma reactor
US6855906B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Oct 11, 2002 |
| Grant date | Feb 15, 2005 |
| Priority date | — |
| Expiry date | Feb 27, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/4652
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention is a plasma-generating device useful in a wide variety of industrial processes. The plasma is formed in a chamber having a toroidal topology, and is heated inductively. As with all inductive plasmas, a primary coil carries an applied AC current, which, in turn, generates a corresponding applied AC magnetic flux inside the plasma. This flux induces current to flow through the plasma in closed paths that encircle the flux, thereby heating and maintaining the plasma. In this invention, the applied AC current flows through the primary coil around substantially the short poloidal direction on the torus. Accordingly, the applied magnetic flux is caused to circulate through the plasma along the larger toroidal direction. Finally, the current induced within the plasma will flow in the poloidal direction, anti-parallel to the applied primary current. The plasma chamber wall is preferably made of metal such as aluminum and includes one or more electrical breaks that extend fully around the chamber wall in the toroidal direction. This prevents poloidal currents from being induced in the chamber wall, ensuring effective power transfer to the plasma. Elastomeric seals made from el…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.