Method of forming phosphor layer of gas discharge tube
US6857923B2 · kind B2 · utility
40Cited by
2References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2002 |
| Grant date | Feb 22, 2005 |
| Priority date | — |
| Expiry date | Aug 11, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/44
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of forming a phosphor layer of a gas discharge tube provided with the phosphor layer on an internal surface of an elongated tubular vessel forming a discharge space. The method includes the steps of introducing a slurry of phosphor powder and a binding resin dispersed in a medium into the tubular vessel, holding the tubular vessel sideways to deposit the phosphor powder and the binding resin in the tubular vessel, and removing the medium from the tubular vessel, thereby forming a phosphor layer on one side of the internal surface of the tubular vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.