Plasma enhanced chemical deposition for high and/or low index of refraction polymers

US6858259B2 · kind B2 · utility

Assignee

• Battelle Memorial Institute · CH

Inventors

• John D. Affinito · Kennewick, US
• Gordon L. Graff · West Richland, US
• Peter M. Martin · Kennewick, US
• Mark E. Gross · Pasco, US
• Paul E. Burrows · Chattaroy, US
• Linda Susan Sapochak · Arlington, US

Key dates

• Filing date: Mar 19, 2001
• Grant date: Feb 22, 2005
• Expiry date: Mar 19, 2021

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05D1/62
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for making a polymer layer with a selected index of refraction. The method includes flash evaporating a polymer precursor material capable of cross linking into a polymer with the selected index of refraction, forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge polymer precursor plasma from the evaporate, and cryocondensing the glow discharge polymer precursor plasma on a substrate as a condensate and crosslinking the condensate thereon, the crosslinking resulting from radicals created in the glow discharge polymer precursor plasma, forming a polymer having the selected index of refraction.