Resist composition with enhanced X-ray and electron sensitivity
US6858372B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 2003 |
| Grant date | Feb 22, 2005 |
| Priority date | — |
| Expiry date | Jun 15, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/167
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A resist composition with enhanced X-ray and electron sensitivity includes a plurality of chemically inert nanoparticles dispersed throughout a base resist material. The nanoparticles have a higher atomic number than the base resist material and each of the nanoparticles is formed by a nanoparticle core, e.g., of a noble metal, coated with an organic capping layer or shell. The latter renders the core dispersible and chemically compatible with the resist material surrounding the nanoparticle. A method of making a resist composition with enhanced X-ray and electron sensitivity is to provide a resist material and disperse chemically inert nanoparticles throughout the resist. The nanoparticles have a higher atomic number than the resist and a have core/shell structure. A resist composition with enhanced X-ray and electron sensitivity can be made by having a nanoparticle core, with a higher atomic number than the resist, that is coated with an organic capping layer. The nanoparticle with the core/shell structure is then dispersed throughout the resist material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.