Compositions having enhanced deposition of a topically active compound on a surface

US6861397B2 · kind B2 · utility

Assignee

• The Dial Corporation · US

Inventors

• Earl P. Seitz, Jr. · Scottsdale, US
• Andrea Lynn Waggoner · Mesa, US
• Priscilla S. Fox · Phoenix, US
• Timothy J. Taylor · Edison, US

Key dates

• Filing date: Jul 10, 2002
• Grant date: Mar 1, 2005
• Expiry date: Dec 24, 2022

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D3/3418
• WIPO field: Pharmaceuticals
• WIPO sector: Chemistry

Abstract

Topically active compositions having enhanced effectiveness are disclosed. The compositions contain a topically active compound, an anionic surfactant, a hydric solvent, a hydrotrope, an optional cosurfactant, and water, wherein a percent saturation of the topical active compound of the composition is at least 25%. The compositions exhibit a rapid and effective topical effect, and effectively deposit the topically active compound for an effective residual effect.