Fluid treatment system and cleaning apparatus therefor
US6863078B1 · kind B1 · utility
5Cited by
12References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 26, 2000 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | May 26, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC02F2201/324
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.