Linearly extended device for large-surface microwave treatment and for large surface plasma production

US6863773B1 · kind B1 · utility

Assignee

• Fraunhofer-Gesellschaft der angewandten Forschung e.V. · DE

Inventors

• Rudolf Emmerich · Bruchsal, DE
• Mathias Kaiser · Waldbronn, DE
• Urban Helfried · Bretten, DE
• Peter Elsner · Remchingen, DE
• Klaus Baumgartner · Sindelfingen, DE
• Eberhard Rauchle · Waiblingen, DE
• Konstantin Räuchle · Waiblingen, DE

Key dates

• Filing date: May 30, 2000
• Grant date: Mar 8, 2005
• Expiry date: Aug 15, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J37/32192
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

The aim of the invention is to provide an alternative to the intensive treatment of a product, especially plasma treatment, in specific areas only. Towards this end, the invention provides a device for producing microwaves for treating workpieces, comprising at least one microwave antenna with an extended conductor for producing alternating electromagnetic fields, a housing that substantially extends over the length of the conductor, and an extended microwave decoupling area which follows the conductor and which is located in the housing. The housing is formed by at least one resonant cavity, which has a long shape and follows the course of the microwave antenna. The resonant cavity has at least one tapering, closed, first crown area and the decoupling area essentially extends in the focussing area of the resonant cavity. An at least non-divergent housing area adjoins the resonant cavity.