Plasma enhanced gas reactor
US6863870B2 · kind B2 · utility
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1References
10Claims
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Assignee
Inventors
Key dates
| Filing date | Aug 22, 2001 |
| Grant date | Mar 8, 2005 |
| Priority date | — |
| Expiry date | Aug 30, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32605
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A reaction chamber (12, 49) is adapted to be coupled to a source of microwave radiation. A pair of opposed field enhancing electrodes (18, 21; 62, 63) concentrate microwave energy so as to form plasma in a localised region between the electrodes. Gas passages are arranged for passing a gaseous medium into and out of the chamber so that the gaseous medium passes through the said localised region of plasma. The electrodes comprise electrically conducting tubes (18, 21; 62, 63) held in electrode holders (17, 19; 53, 54) located in the chamber wall, the electrode tubes being removable and replaceable from outside of the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.