Optical system with isolated measuring structure

US6864988B2 · kind B2 · utility

Assignee

• Carl Zeiss Semiconductor Manufacturing Technologies AG · DE

Inventors

• Albrecht Hof · Aalen, DE
• Guenter Maul · Aalen, DE
• Michael Muehlbeyer · Aalen, DE
• Klaus Mehlkopp · Alsdorf, DE

Key dates

• Filing date: Jul 1, 2002
• Grant date: Mar 8, 2005
• Expiry date: Mar 10, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70833
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical system, in particular an exposure lens for semiconductor lithography, with a plurality of optical elements has at least one load-dissipating structure. The load-dissipating structure diverts the forces originating from the optical elements. The optical system also has a measuring structure constructed independently of the at least one load-dissipating structure.