Quartz glass jig for processing apparatus using plasma
US6869898B2 · kind B2 · utility
50Cited by
6References
8Claims
0Family size
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Key dates
| Filing date | Jul 30, 2001 |
| Grant date | Mar 22, 2005 |
| Priority date | — |
| Expiry date | Sep 18, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2204/08
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An object of the present invention is to provide a quartz glass jig, which, when employed in a processing apparatus using plasma, is less in generation of abnormal etching and particles and low in contamination with impurities. This object is obtained by a quartz glass jig for a processing apparatus using plasma, wherein a surface of the jig is subjected to grinding or a sandblast processing and has a surface roughness Ra in the range of from 2 μm to 0.05 μm, and microcracks of grinding marks formed during the grinding or sandblast processing have a depth of 50 μm or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.